| 摘要 |
PURPOSE:To process also a pattern inverted at its white and black from an input pattern similarly to a normal pattern by changing values alpha, beta, S to be parameters to change a pattern to be extracted. CONSTITUTION:When an input pattern 1 is supplied to a pattern outline extracting processing part 3, the 1st blur factor applied pattern to which the blur factor alpha of the 1st level is applied and the 2nd blur factor applied pattern to which the blur factor beta of the 2nd level is applied are formed and an outline pattern 4 is obtained correspondingly to a position on which a difference between both the patterns is larger than a threshold S. When an objective pattern 2 is supplied to a pattern forming processing part 5, a signal level (e.g. logic '1') applied from an objective point to the objective point concerned is propagated to peripheral picture elements and the succeeding propagation is stopped on the position of the outline pattern 4 to obtain a formed pattern 6. |
