| 摘要 |
A positive-type photosensitive electrodeposition coating composition comprising (A) a photosensitive compound having a molecular weight of less than 6,000 and containing at least one modified quinonediazidesulfone units represented by the following formula (I) (I) wherein R1 represents or , R2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, and R3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, in the molecule and (B) an acrylic resin having a salt forming group.
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