| 摘要 |
PURPOSE:To carry out the cooling of a thin film in good efficiency without generating the deterioration of the formed thin film, by introducing a hydrogen gas into a container after a thin film is grown on a substrate to carry out the cooling of the thin film. CONSTITUTION:In forming a thin film of amorphous silicon, silicon is heated and evaporated while a base plate 4 is heated and deposited on the base plate 4 while activated or ionized hydrogen is taken in from an introducing pipe 9 to grow the film and, succeedingly, a hydrogen gas is introduced from the introducing pipe 9 to rapidly cool the film within a short time. By this method, the formed film can be cooled in good efficiency without deteriorating the same. |
