| 摘要 |
<p>PURPOSE:To facilitate the reshorting of electrode wiring after cutting the short- circuit wiring by forming the short-circuit wiring by an etching resistant material which has less etching resistance than the end member of the row and column electrode wiring. CONSTITUTION:On a transparent insulating substrate 1, a picture element electrode 5, which is a matrix arrange transparent conducting film, the row electrode wiring 2 of a gate electrode and the column electrode wiring 3 of a source electrode are formed, and the same shaped under members 8 are formed on the positions being the terminal parts and end parts 2a, 2b, and 3a, 3b of wiring 2 and 3. Then, the terminal parts and the terminals 2a, 2b and 3a, 3b, and a short ring 6 are formed on the member 8 by using the material which has less etching resistance than the member 8, and the wiring 2 and 3 are shorted, and the short-circuit wiring is cut by the etching at the product completing stage. The member 8 is left by such cutting, and the reshorting of the electrode wiring is easily carried out after production is completed.</p> |
