发明名称 RESIST
摘要 PURPOSE:To ensure faithful transfer of a pattern to a substrate, etc., by using novolak resin obtd. by condensing isopropenylphenol and other phenol deriv. with a carbonyl compd. as an alkali-soluble resin. CONSTITUTION:Novolak resin contg. structure units of isopropenylphenol which clears the profile of a pattern, increases the mol.wt. and improves the heat resistance is used as an alkali-soluble resin for a resist. The novolak resin further contains structural units of xylenol having high heat resistance and/or structural units of cresol which clears the profile of a pattern. Novolak resin obtd. by condensing m-isopropenylphenol, m-cresol and 3,5-xylenol with a carbonyl compd. can remarkably improve the characteristics of a resist because it has superior heat resistance and resolving power and can extremely clear the profile of a pattern.
申请公布号 JPH01277234(A) 申请公布日期 1989.11.07
申请号 JP19880106216 申请日期 1988.04.28
申请人 TOSHIBA CORP 发明人 HAYASE SHUJI;GOKOCHI TORU;ONISHI KIYONOBU;HORIGUCHI RUMIKO
分类号 G03C1/72;G03F7/039;H01L21/027 主分类号 G03C1/72
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