| 摘要 |
There is disclosed a specific method, which is applied to a charged particle beam pattern drawing system, for drawing a circuit pattern on a workpiece using a charged particle beam. A circuit pattern to be drawn is first divided into unit figures by parallel line segments extending from the vertexes of the figure that has a polygonal planar shape in a first reference direction. Each of the unit figures corresponds to a specific reference figure registered in advance. When the divided unit figures include an elongated too-small figure having at least one side shorter than a predetermined minimum allowable length, the too-small figure is merged with at least one unit figure adjacent to it at least once, and thus an expanded unit figure is defined. The expanded unit figure is divided into new unit figures by parallel line segments extending from its vertexes in a second reference direction perpendicular to the first reference direction so as to correspond to the reference figures. As a result, remaining of the too-small figures in the circuit pattern to be actually subjected to charged particle beam pattern drawing is minimized.
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