| 摘要 |
PURPOSE:To produce multielement thin films having desired compsn. destributions in a thickness direction by using a specific target electrode material, and moving the position of a substrate in the direction where the compsns. of the electrode material change within the plane parallel with the surface of the target electrode. CONSTITUTION:A target electrode 2 for sputtering wherein materials 4 of different compsns. are arrayed and combined successively by means of adhesive agents 3 on a flat plate and a substrate 5 which is supported with a holder 6 mounted with a heater 7 are provided in parallel in a vacuum vessel 1 which is provided with an introducing port 9 for an inert gas on the top surface and an evacuating port 10 on the side surface in the lower part. An inert gas is introduced into the vessel 1 through the port 9, and is controlled to a specified gaseous pressure. Voltage is then applied to the electrode 2 and the substrate 5 is moved by a moving mechanism 8 in the direction where the comspns. of the materials of the electrode 2 change within the plane parallel with the surface of the target electrode, whereby the multielement thin films having desired compsns. in the depth direction are formed. |
