IMPROVED DEVELOPER SOLUTIONS FOR PMMA ELECTRON RESIST,申请号US1989000705-传众专利搜索

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发明名称	IMPROVED DEVELOPER SOLUTIONS FOR PMMA ELECTRON RESIST
摘要	<p>An improved developer for PMMA electron resist comprising an effective amount of MEK in combination with MIBK or CS alone or a mixture thereof.</p>
申请公布号	WO1989008280(A1)	申请公布日期	1989.09.08
申请号	US1989000705	申请日期	1989.02.22
申请人		发明人
分类号		主分类号
代理机构		代理人
主权项
地址

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