发明名称 Plasma treating apparatus and gas temperature measuring method.
摘要 <p>Nitrogen gas plasma emission intensities are theoretically calculated at various gas temperatures, while they are actually measured by a spectroscope. By comparing the waveforms of the calculated and measured emission intensities with each other, the nitrogen gas temperature at an arbitrary point in a plasma treating room can be determined.</p>
申请公布号 EP0329179(A2) 申请公布日期 1989.08.23
申请号 EP19890102802 申请日期 1989.02.17
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 ISHIRARA, SHIN-ICHIRO
分类号 C23F4/00;G01K11/20;H01J37/32;H01L21/302;H01L21/3065 主分类号 C23F4/00
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