发明名称 |
Plasma treating apparatus and gas temperature measuring method. |
摘要 |
<p>Nitrogen gas plasma emission intensities are theoretically calculated at various gas temperatures, while they are actually measured by a spectroscope. By comparing the waveforms of the calculated and measured emission intensities with each other, the nitrogen gas temperature at an arbitrary point in a plasma treating room can be determined.</p> |
申请公布号 |
EP0329179(A2) |
申请公布日期 |
1989.08.23 |
申请号 |
EP19890102802 |
申请日期 |
1989.02.17 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
ISHIRARA, SHIN-ICHIRO |
分类号 |
C23F4/00;G01K11/20;H01J37/32;H01L21/302;H01L21/3065 |
主分类号 |
C23F4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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