| 摘要 |
PURPOSE:To form the metal pattern consisting of the ultrathin metal film having a high resolution and excellent uniformity by forming an atomic or molecular metal on a photosensitive monomolecular thin film by a chemical reaction. CONSTITUTION:A sensitive thin film contg. a sensitive group causing a chemical reaction by an energy beam (electron beam, etc.) is formed on an insulating substrate. A patterned energy beam, for example, is then projected to selectively deactivate or activate a part of the sensitive group. A chemical substance (metal compd.) contg. a metal is joined to the part of the sensitive thin film where the sensitive group still remains in the succeeding stage to form a patterned ultrathin metal film. In this case, a -CHO group, for example, is previously formed in the monomolecular film or on the surface of the monomolecular film. A molecular or atomic metal film is deposited and formed on the monomolecular film from the water-soluble metal compd. by utilizing the reducing action of the -CHO group. Silver can be exemplified as the metal, and one end of the sensitive thin film contains Si, for example. |
