发明名称 PHOTOSENSITIVE POLYMER COMPOSITION
摘要 PURPOSE:To obtain the subject compsn. having excellent storage stability, heat resistance and development characteristics and being capable of forming a thick film, by compounding a photo-polymn. initiator in a polyimide precursor having a specified structural unit. CONSTITUTION:A polyamic acid of formula I (wherein R<1> is a divalent org. group and n is 1 or larger) is obtd. by dissolving a diamine (e.g., 4,4'- diaminodiphenyl ether) in a polar solvent (e.g., N,N-dimethylacetamide) and reacting p-terphenyl-3,4,3',4'-tetracarboxylic dianhydride therewith. Then, a polyimide precursor having a structural unit of formula IV (wherein R<2> is a group contg. C=C; X is O or NH group) is obtd. by reacting a compd. of formula II (wherein R<3-5> is each H or CH3; R<6> is a divalent hydrocarbon group; Y is an NCO group or a group of formula III) (e.g., isocyanatoethyl methacrylate) in the presence of a catalyst (e.g., N,N-dimethylbenzylamine). 100pts.wt. this precursor, 0.01-30pts.wt. photo-polymn. initiator (e.g., benzophenone) and, if necessary, a polymerizable unsatd. compd. (e.g., methyl acrylate) for improving sensitivity are compounded.
申请公布号 JPH01118513(A) 申请公布日期 1989.05.11
申请号 JP19870276639 申请日期 1987.10.30
申请人 HITACHI CHEM CO LTD 发明人 KOJIMA MITSUMASA;KIKUCHI NOBURU;SAITO TAKAYUKI;ISHIMARU TOSHIAKI;KOJIMA YASUNORI;SATO KUNIAKI
分类号 C08F2/48;C08F290/00;C08F299/02;C08G73/10;C08L79/08;G03F7/028;G03F7/038 主分类号 C08F2/48
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