| 摘要 |
PURPOSE:To solve the problem of defects of a resist pattern by coating a resist with a water soluble CEL material and carrying out heat treatment. CONSTITUTION:A substrate 1 is successively coated with a photosensitive resin, that, is a positive type resist 2 and a water soluble resin contg. a compd. which is faded by light, that is, a contrast enhanced lithographic (CEL) material 3. The coated substrate is heated 4 and then exposure and development are carried out. By the heating 4, the gas permeability of the water soluble CEL material 3 is improved and the material 3 is prevented from taking in gaseous N2 from the resist during exposure, so the problem of defects of a resist pattern can be solved and a pattern having high resolution and a high aspect ratio is obtd. |
