发明名称 |
Developer solution for positive-working photoresist compositions comprising a base and a non-ionic surfactant |
摘要 |
The aqueous developer solution for a positive-working photoresist composition comprises, as dissolved in an aqueous solvent, a water-soluble organic basic compound and a specific non-ionic surface active agent which may be an alkyl-substituted phenyl or naphthyl ether of polyoxyethyleneglycol in a specified concentration. The developer solution is advantageous in respect of the completeness of removal of film residua and scums from the substrate surface after development so that the patterned photoresist layer is imparted with greatly increased accuracy and fidelity of the pattern reproduction.
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申请公布号 |
US4820621(A) |
申请公布日期 |
1989.04.11 |
申请号 |
US19870067312 |
申请日期 |
1987.06.26 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
TANKA, HATSUYUKI;SATO, YOSHIYUKI;KOHARA, HIDEKATSU;NAKAYAMA, TOSHIMASA |
分类号 |
G03C1/72;G03F7/00;G03F7/30;G03F7/32;H01L21/027;H01L21/30;(IPC1-7):G03C5/18;G03F7/26 |
主分类号 |
G03C1/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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