| 发明名称 |
Laser pattern generation apparatus |
| 摘要 |
A laser pattern generation apparatus particularly suited for semiconductor applications. The laser beam is split into a plurality of beams and modulated with acousto-optic modulators. A rotating mirror having a plurality of facets causes the beam to scan the workpiece.
|
| 申请公布号 |
US4796038(A) |
申请公布日期 |
1989.01.03 |
| 申请号 |
US19880178868 |
申请日期 |
1988.03.28 |
| 申请人 |
ATEQ CORPORATION |
发明人 |
ALLEN, PAUL C.;WARKENTIN, PAUL A. |
| 分类号 |
G03F7/20;(IPC1-7):G03B41/00;G01D9/42 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
