| 摘要 |
<p>Step-and-repeat exposure apparatus for printing, by way of a projection optical system, images of a pattern formed on a reticle (2) upon different portions of a semiconductor wafer (4), placed on a movable stage (5), is disclosed. On the portion of the movable stage other than the portion upon which the semiconductor wafer is placed, an erasably writable recording medium (6) such as, for example, a magneto-optic recording material or a photochromic material is provided. An image of a mark (18) of a reticle is formed on the recording medium by use of the projection optical system the thus formed image being photoelectrically detected (at 9). From the result of detection, alignment information concerning, for example, a magnification error, a focus error, a positional error between the reticle and the wafer, etc. is obtained.</p> |
