| 摘要 |
PURPOSE:To obtain the title compound metal solution which can be produced at low temp. and in good stoichiometric amt. and has superior film forming characteristic by dissolving uniformly a Cu chelate compd. and a specified metal alkoxide in an org. solvent. CONSTITUTION:The aimed compound metal soln. is obtd. by adding a chelate compd. of Cu, and alkoxide of a IIa group metal, and an alkoxide of a IIIa group metal to an org. solvent, and dissolving the materials uniformly in the solvent. Effective chelate compd. to be used is such as nitrilotriacetate, beta- diketone, oleic acid, phthalic acid, etc. particularly, diketones such as acetlyacetone, oxine, methyl or ethyl acetate, monobasic carboxylic acid, polybasic carboxylic acid. This reaction is accelerated by treating the materials in an org. solvent while refluxing the solvent, or by adding a trace amt. of aldehyde or org. acid, thus the solubility of the materials in the org. solvent and the stability of the solution are improved. |
