| 摘要 |
PURPOSE:To measure configurations, sizes and the like of all patterns with sufficient accuracy, by obtaining alignment error data based on the results of measurement of the configurations, sizes and the like of the first pattern, and correcting the amount of the movement when the alignment to the initial position with respect to the second pattern is performed. CONSTITUTION:A probe LS is set so that a specified minute pattern L is scanned from an initial position Rij, which has a specified position relationship with respect to a first pattern PTij on an object to be measured W. The configuration, size and the like of the first pattern PTij on the object to be measured W are measured 5 with the probe LS. The measuring part 5 obtains alignment error data DELTAX and DELTAY based on the results S2 and S3 of measurement of the configuration, size and the like of the first pattern PTij. An alignment part 3 corrects amounts of movements dX1 and dY1, when position alignment is performed from the initial position Rij for the first pattern PTij with the probe LS to the initial position Ri+mj+n for a second pattern PTi+mj+n, based on the alignment error data DELTAX and DELTAY. |
