| 摘要 |
PURPOSE:To permit formation of a film having good film quality uniform over a large area by disposing a magnet to one side of an outlet of a plasma generating means of a titled device for bringing evaporating particles or reactive gaseous particles into collision against the side face of circular cylindrical plasma. CONSTITUTION:After the inside of a vacuum chamber 5 is evacuated to a vacuum, a desired low-pressure gas is introduced therein and is stabilized. The plasma is then generated in a plasma generating chamber 2 and a material to be deposited by evaporation in a crucible 6 is irradiated by an electron gun 4 to bring the evaporated vapor particles thereof into collision against the side face of the plasma focused to a circular cylindrical shape by a plasma control part 3, by which the particles are ionized. The ions are accelerated to arrive at a base metal S to be treated to form the film thereon. The bar magnet 10 to flatten the plasma is provided to the control part 3 of such device so that the circular cylindrical plasma having the flattened surface is thereby formed from the base material S side in the main chamber 1. The above- mentioned ionization is, therefore, efficiently executed and the formed ion plating film has excellent film quality uniform over a large area.
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