发明名称 A METHOD FOR THE PREPARATION OF A THIN SEMICONDUCTOR FILM
摘要 <p>A method of preparing a thin film of a semiconductor material on a substrate, in which charged microdroplets of the semiconductor material (12) or a constituent thereof are generated by electrohydrodynamic (EHD) extraction of the droplets from a meniscus (16) formed at an elongate tip (14) of a nozzle (11) containing the material in a molten state, the EHD extraction occurring under the influence of a high electric field produced by an extractor electrode (17) adjacent the tip (14) of the nozzle (11). The microdroplets are then accelerated away from the elongate tip (14) of the nozzle (11) to form a two-dimensional ribbon-like beam or blanket (19) of the charged microdroplets. The two-dimensional beam (19) is directed onto the trailing edge of a target (26) carried on a moving substrate (27) such that a film of the semiconductor material is formed on the substrate by deposition of the microdroplets on the trailing edge of the moving target.</p>
申请公布号 WO1988005835(A1) 申请公布日期 1988.08.11
申请号 GB1987000095 申请日期 1987.02.06
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