| 摘要 |
PURPOSE:To increase the difference in solubility between an exposed part and unexposed part by using a two-layered resist consisting of a mixed layer contg. an alkali-soluble high-polymer compd. and azide compd. and radiation sensitive compsn. layer contg. a diazonium salt. CONSTITUTION:A pattern is formed on a substrate 3 by the resist process using the two-layered resist consisting of the mixed layer 2 contg. the alkali-soluble high-polymer compd. (A) and the azide compd. (B) and the radiation sensitive compsn. layer 1 contg. the diazonium salt. An alkali-soluble phenolic resin such as polyvinyl phenol is preferable as the component (A) and an arom. azide compd. is usable for the component B. Since the surface layer in the exposed part of the layer 2 is insolubilized according to this constitution, the pattern of high contrast is obtd. Since the inside of the layer 2 is insolubilized by exposure as well, side etching is prevented at the time of development and the fine pattern having high resolution is formed. |
