| 摘要 |
PURPOSE:To enable the inspection of fine pattern to be performed with high precision by a method wherein a material with an inspected pattern is scanned by charged particle beams to detect the signals corresponding to the pattern. CONSTITUTION:Scanning signals roughly scanning relatively wide range are transmitted to a deflecting coil 3 from a quadratic scanning circuit 7 by the commands from a CPU 6. Resultantly, the specified region of material 4 is roughly scanned by electron beams. The reflected electrons from the material 4 are detected by a reflected electron detector 6 due to the electron beam irradiation to the material 4. The detecting signals amplified by an amplifier 9 are qyadratically stored in a buffer memory 10 whereto any reference signals are transmitted from the quadratic scanning circuit 4. Finally, the CPU 6 samples specific point of contour part of inspected pattern from the stored data; chase- measures the equisignal level lines (contour lines) starting from the specific point; and controls the contour lines to detect the coordinate positions of pattern contour. |
