| 摘要 |
PURPOSE:To contrive to be able to decide simply and reliably the end of polishing by a method wherein a marker of a combination of a plurality of recessed parts, each having a different size, is formed on a scribing line of other proper region and the size of a recessed part making a residual- nonresidual boundary is inspected in the process of polishing to decide the end of polishing. CONSTITUTION:A groovelike opening 7 is formed on an element isolation region and after an insulating film 8 is formed on the inner surface thereof, a poly Si layer 9 is formed. Before the groovelike opening 7 is embedded by polishing, a group 10 of slits (recessed parts) is formed on a scribing line. Then, a marker consisting of the group 10 of slits is inspected in a process for polishing the poly Si layer 9 and the residual state of the poly Si layer 9 on those slits is inspected. A state that no residue exists in a slit of a width which has been confirmed in a preliminary test is detected and the state is decided to be the completion of polishing.
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