| 摘要 |
PURPOSE:To form an electrophotographic sensitive body high in photosensitivity by using as a barrier layer a laminate of a layer made of boron nitride and another layer made of microcrystalline silicon (muc-Si), a photoconductive layer, and a surface potential retentive layer made of microcrystalline silicon (muc-Si). CONSTITUTION:The electrophotographic sensitive body is composed of a conductive substrate 14, a first barrier layer 21 made of boron nitride, a second barrier layer 22 made of microcrystalline silicon (muc-Si) containing at least one of C, O, and N, a photoconductive layer 23 made of amorphous silicon (a-Si), containing <=5atom% H, and the surface potential retentive layer 24 made of microcrystalline silicon (muc-Si) containing at least one of C, O, and N. Preferable thickness of the layers 21, 22, and 24 are 20-500mum, 20-500mum, and 50-1,000mum, respectively. |
