发明名称 SURFACE TREATMENT DEVICE
摘要 PURPOSE:To obtain a device in which only particles necessary for surface treatment out of the scattered particle rays are made incident without ion rays recoiling at the scattering solid atoms, by cooling the scattering solid and then making its surface adsorb gases. CONSTITUTION:In a device in which ion rays 2 are radiated on the surface of a solid 3 and the particular rays 4 scattered on the surface are made incident to the surface of a sample solid in order to perform surface treatment of the sample 5, as means to cool the solid 3 for scattering the ion rays 2 and another means to adsorb gases to the surface are installed. The ion beam 2 drawn out from an ion source 1, for example, is radiated on the scattering solid 3, and then the particles 4 scattered on the surface are made incident on the processed matter 5 in order to perform the surface treatment. The gasses 7 introduced into a reaction container are absorbed in the surface of the solid 3 cooled by a cooling device 6, and most part of the ion beam 2 incident on the scattering solid 3 is then scattered on this gas adsoption layer, so that partial incident ions are made to recoil at the absorbed materials and spring out from the surface.
申请公布号 JPS62291030(A) 申请公布日期 1987.12.17
申请号 JP19860133651 申请日期 1986.06.11
申请人 HITACHI LTD 发明人 TAJI SHINICHI;OKUDAIRA SADAYUKI
分类号 H01L21/302;C23F1/00;H01L21/3065 主分类号 H01L21/302
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