| 摘要 |
<p>A one-step process for purifying an inert gas comprises contacting the inert gas including minute quantities of an impurity selected from the group consisting of CO, CO2, O2, H2, H2O and mixtures thereof with a particulate material comprising nickel in an amount of at least about 5% by weight as elemental nickel distributed over an effective area of surface, typically from about l00 to 200 m<2>/g, thereby forming an inert gas having less than l ppm and preferably less than 0.l ppm of any such impurity.</p> |
