| 摘要 |
PURPOSE:To improve quality of a blazed grating of a transmission type by forming the brazed grating on an org. high polymer film by utilizing the difference in etching speed between a metallic layer and the org. high polymer film with the relief grating formed on a photoresist film as a mask. CONSTITUTION:Electron ray resist film 2 is coated as an org. high polymer film on a substrate 1 and a gold layer 3 which is lower in etching rate with oxygen ion than the electron ray resist film is coated thereon. A photoresist film 4 which is lower than gold in etching rate with argon ion is coated on the surface thereof. A relief grating is formed on the photoresist film and the film is ion- etched with an argon ion beam with said grating as a mask to form a grating having roughly a rectangular section on the layer 3. A grating having roughly a rectangular section is formed on the layer 2 with the grating of the layer 3 as a mask. The resist 4 and the layer 3 are removed and thereafter the resist film is ino-etched from the direction of an arrow 5 by which the blazed grating having high quality is obtd. |
