OPPOSED TARGET TYPE SPUTTERING DEVICE

摘要

PURPOSE:To stabilize the plasma to be formed between opposed targets and to make the characteristics of a thin film uniform by providing means for radiating electrons alongside the spacing between the targets. CONSTITUTION:A substrate 13 is disposed alongside the spacing between the opposed targets 1 and 2 and the plasma generated between the targets 1 and 2 sputter the targets 1, 2 to form the thin film on the substrate 13. A hot cathode 15 and an anode 16 facing said cathode are provided alongside the spacing between such targets 1 and 2. The electrons radiated from the hot cathode 15 are radiated into the spacing between targets 1 and 2 so that the electrons are intruded into the plasma. The thin film is formed at a high speed under a high vacuum by such method. The environmental characteristics of the film are improved in the case of forming the thin film consisting of a rare earth-fiber metallic material having a magnetooptic effect.