发明名称 CHARGING IN VESSEL
摘要 PURPOSE:To fluid substrate is continuously charged in vessels directly through a pipe without storage in the surge tank so that the pressure of the substrate is kept in reduced change to prevent the substrate such as sensitively deteriorative meringue from changing in quality. CONSTITUTION:Vessels are allowed to linearly move in order at constant intervals at a certain speed and the orifices 11 and 11' of the 2 charging pipe 9, 9' branching from the pipe 6 for feeding the fluid substrate are allowed to reciprocate in the direction along the vessel movement between a prescribed distance, while the fluid substrate is selectively and continuously extruded out of both of the orifices. After the orifice is put into a vessel, the substrate is injected into the vessel,as the orifice moves forward together with the vessel. In the meantime, the other orifice is allowed to move to the next vessel to be filled. When both orifices reach the ends of their movement of the prescribed distance and the fluid substrate is charged in the vessel in the prescribed amount, the injection from both orifices is instantaneously switched to start the injection into the next vessel. The orifice which has completed its injection is allowed to move to then next vessel. The operations mentioned above are repeated.
申请公布号 JPS62158454(A) 申请公布日期 1987.07.14
申请号 JP19860001591 申请日期 1986.01.07
申请人 TAKARABUNE:KK 发明人 INOKAWA SHUNJI
分类号 A23G3/00;A21C11/16;A21D8/02;A23G3/20;A23G3/34;A23G9/24;B65B3/06 主分类号 A23G3/00
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