| 摘要 |
PURPOSE:To permit the easy ripple control of a pass band width and pass band and to improve the accuracy of film thicknesses by using plural monitor substrates and maintaining the optical film thicknesses of respective layers under prescribed conditions. CONSTITUTION:A short wavelength range pass filter is constituted of an optical glass substrate 10, a vapor deposited zirconium oxide film 11, vapor deposited silicon dioxide films 12 and 14, vapor deposited titanium dioxide films 13 and 15 and an adhesive agent layer 16. The production of such short wavelength range pass filter is executed by using 16 sheets of the monitor substrates in the position of the monitor substrate 23 in an electron beam vapor deposition device, and forming the films while controlling the optical film thicknesses of the respective layers by the same monitor substrate for the two layers; the (2n-1)th layer (n is a natural number) and (2n)th layer from the substrate side if the high refractive index material (or intermediate refractive index material) of the (2n-1)th layer and the low refractive index material of the (2n)th layer have the same optical film thickness and by respectively one sheet of the monitor substrates if the (2n-1)th layer and (2n)th layer have different optical film thicknesses. |
