| 摘要 |
PURPOSE:To enable resist to be developed uniformly, by supplying a developing solution from the bottom face of a temperature-regulating plate and causing the developing solution to be held between the wafer and the temperature- regulating plate. CONSTITUTION:A temperature-regulating plate 2 is arranged at a certain distance from a wafer 1. A developing solution is dripped from a nozzle 6 provided at the center of the rear face of the temperature-regulating plate 2. The dripped developing solution is held between the wafer 1 and the temperature-regulating plate 2 to form a layer with a uniform thickness by the effect of surface tension. Since the temperature-regulating plate 2 is held at a fixed temperature by circulation of temperature-regulating water 4, the developing solution 3 is also held at a fixed temperature and, therefore, resist on the wafer 12 can be developed uniformly under constant conditions. |
