| 摘要 |
PURPOSE:To dispense with disposal work of a chemical liquid such as a resist by the mounting and detachment of a trap, by making it possible to automatically recover the chemical liquid in the trap to a drain tank in conjunction with the air vent operation of a filter. CONSTITUTION:In a chemical liquid supply apparatus system such as a resist applicator, when a resist bin 2 is replaced, a trap 4 is reduced in pressure by a negative pressure source 5 and air venting in a filter 1 is performed through a check valve 6. Because a resist is flooded into the trap 4 when the filter 1 was filled with the resist, the negative pressure source 5 is stopped. Thereafter, when the trap 4 returns to atmospheric pressure, a check valve 7 automatically opens and the resist accumulated in the trap 4 is automatically recovered in a drain tank. |
