| 摘要 |
PURPOSE:To reduce the difficulty for processing the gap depth with high precision by producing a grinding pattern from an inter-layer insulated film that prescribes the gap position. CONSTITUTION:Both a lower magnetic film 1 and a grinding pattern film 4 are formed at a time. Then an inter-layer insulated film 3b are formed to prescribe the gap position and at the same time the film 4 is partly covered with a cover film 5 in a desired form. Then an upper magnetic film is formed and removed at a part of the exposed film 4 and its periphery. Then the upper magnetic film is covered with a cover film having higher release properties than the film 5. The exposed part of the film 4 is etched by an acidic aq. solution, etc. Thus a grinding pattern is produced and the undesired cover film is removed. Then a passivation film is formed on the entire surface of a substrate. In such a way, the gap depth is processed with high precision in the final grinding process of a counter face to a recording medium. |
