发明名称 |
Plasma CVD apparatus and method for forming a diamond like carbon film |
摘要 |
A plasma CVD apparatus comprises a first vacuum enclosure with a plasma generating means, an accelerating means for accelerating ions in a plasma toward a substrate and a second vacuum enclosure connected to the first vacuum enclosure, so that the plasma gas flows into the second vacuum enclosure and forms a film of uniform and superior quality at high speed.
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申请公布号 |
US4645977(A) |
申请公布日期 |
1987.02.24 |
申请号 |
US19850803001 |
申请日期 |
1985.11.29 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
KUROKAWA, HIDEO;MITANI, TSUTOMU;YONEZAWA, TAKETOSHI |
分类号 |
C23C16/26;C23C16/452;H01J37/32;(IPC1-7):H01J7/24 |
主分类号 |
C23C16/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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