| 摘要 |
PURPOSE:To obtain a positive type photosensitive composition high in sensitivity and oxygen plasma resistance by incorporating a specified phenylsil-sesqui-oxane polymer or phenylsiloxane polymer alone or together with an o-naphthoquinone derivative in the photosensitive resin compound. CONSTITUTION:The photosensitive resin composition contains the phenylsil- sesqui-oxane or phenylsiloxane polymer represented by general formula I and III alone or together with the o-naphthoquinone derivative represented by general formula II, and in these formulae, Y is -OH, -(CH2-)pC(=0)-OH; p is an integer of >=1; each of R, R', R'' is H, alkyl, or phenyl, l, m, n are each a positive integer, and l and n are not simultaneously 0; X is -OH, -OCl, -OF, or one selected from a group of formulae IV. |
