| 摘要 |
PURPOSE:To enhance the workability of the titled device by a method wherein a sample is closely contacted to a fluorescent plate outside a highly vacuum chamber, and an exposing process is performed by the pattern drawn on the fluorescent plate which constitutes the highly vacuum chamber, thereby enabling to unnecessitate the taking in and out operation of the sample performed on the vacuum chamber. CONSTITUTION:A resist-coated wafer 14, which is the material to be exposed, is closely contacted to the back side of a fluorescent plate 7. Said sample 14 is placed on the sample supporting stand 16 provided in a low vacuum chamber 15. The sample is constituted in cuch a manner that it is pushed up together with the low vacuum chamber 15 and closely contacted to the fluorescent plate 7. As the inside of the low vacuum chamber 15, whereon the sample 14 is placed, is in the state of vacuum lower than that of the high vacuum chamber 6 in which a vacuum optical system is placed, the vacuum chamber 15 can be evacuated in a short period. Besides, as it is unnecessary to place the sample into the high vacuum chamber 6, the long period of preparation such as a preexhaustion, a high vacuum evacuation and the like required in the past is unnecessitated, thereby enabling to sharply cut down the time required for the exchange of a sample including the evacuation of the vacuum chamber. |
