| 发明名称 |
Process for pattern formation. |
| 摘要 |
<p>A predetermined pattern is formed by effecting patterning of a thermosetting resin film or a film (11) formed on a thermosetting resin film (3). A multilayer resist process is used in which a thermoplastic resin film (10) is used as the bottom layer. This use of a thermoplastic resin is advantageous because the thermoplastic resin film alone can be selectively removed by dissolution in an organic solvent, so that the bottom layer can be removed without detriment to the thermosetting resin film (3).</p> |
| 申请公布号 |
EP0200477(A2) |
申请公布日期 |
1986.11.05 |
| 申请号 |
EP19860303091 |
申请日期 |
1986.04.24 |
| 申请人 |
HITACHI, LTD. |
发明人 |
NISHIDA, TAKASHI;MUKAI, KIICHIRO;HONMA, YUKIO |
| 分类号 |
G03F7/09;G03C5/00;G03C1/00;G03F7/11;G03F7/26;H01L21/027;H01L21/302;H01L21/3065;(IPC1-7):G03F7/02 |
主分类号 |
G03F7/09 |
| 代理机构 |
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代理人 |
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