| 摘要 |
PURPOSE:To enable to form a pattern without shifting a substrate by a method wherein an incident light is made to irradiate on the substrate through a mask with which a desired pattern is image-formed on the substrate. CONSTITUTION:A mask 11 is provided between a laser oscillator 1 and a substrate 10. The laser light 9 oscillated by the laser oscillator 1 is introduced into a reaction chamber 2 through the mask 11, it is made to irradiate on the substrate 10 and a desired pattern is drawn. The generation of a reaction is accelerated by the photo excitation or the heating of the substrate by the reaction gas on the part whereon a laser light is made to irradiate, a film is grown on the part whereon the laser light is made to irradiate, and a film pattern is formed. Besides, a plurality of patterns can also be formed on the same substrate by shifting a base board 3. Besides, the formation of a CVD film, etching gas is formed by the photoinduction reaction by selecting reaction gas, thereby enabling to perform an etching. |
