Chromium plating process for producing non-iridescent, adherent, bright chromium deposits at high efficiencies and substantially free of cathodic low current density etching.

摘要

A chromium plating process for producing a non-iridescent, adherent, bright chromium deposit at high efficiencies and high temperatures under conditions such that the process is substantially free of cathodic low current density etching. The bath used consists essentially chromic acid and sulfate in predetermined concentrations, and an organic sulfonic acid or salts thereof, where the ratio of S to C is a 1/3, e.g. methyl, ethyl and propyl sulfonic acid, and methane and 1,2-ethane disulfonic acid. The bath is substantially free of carboxylic acids, phosphonic acids, perfluoroloweralkyl sulfonic acids, and halides.