发明名称 SEMICONDUCTOR DEVICE
摘要 PURPOSE:To produce a new type transistor by a method wherein a secondary carrier to be stored in a potential well produced by hetero junction of semiconductor or any other junction corresponding thereto is shifted to adjoining potential well. CONSTITUTION:In order to control the secondary electronic gas in a potential well, the proper film pressure (d) of an N type AlxGa1-xAs 20 is selected and a gate electrode 19 for Schottky junction is provided. On the other hand, a source electrode 18 ohmic-connecting to the secondary electrons in the potential well, a buried layer AlxGa1-xAs 24 and a drain electrode 17 ohmic-connecting to the secondary electrode gas in another potential well are respectively provided.
申请公布号 JPS6191965(A) 申请公布日期 1986.05.10
申请号 JP19840212525 申请日期 1984.10.12
申请人 HITACHI LTD 发明人 USAGAWA TOSHIYUKI;ONO YUICHI;SHIRAKI YASUHIRO;TAKAHASHI SUSUMU;HASHIMOTO TETSUKAZU
分类号 H01L29/812;H01L21/338;H01L29/10;H01L29/778;H01L29/78 主分类号 H01L29/812
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