| 摘要 |
PURPOSE:To prevent the diffusion of substances constituting the photo shielding layer by providing the first photo-permeable insulation layer that prevents the diffusion of the substances of the photo shielding layer and the second photo-permeable insulation layer having small deposition strain between the photoelectric conversion element. CONSTITUTION:A photo-permeable insulation substrate 1 of glass is coated with high- melting-point and non-transparent substance such as Cr, Ta, W, or Ti so that a film thickness for shielding at least visible light may be located at least at the part of a photoelectric conversion element 5, thus forming the photo shielding layer 2. Next, an irradiation window 3 is formed in the layer 2 by photolithography or the like. Further, the first photo-permeable insulation layer 12 having a thickness of 5-10,000Angstrom or preferably 500-5,000Angstrom and preventing the diffusion of the substances in the layer 2 is formed by sputtering or the like. Then, the second photo-permeable insulation layer 13 is formed in order to reduce the deposition strain between a thin film of II-VI group compound such as CdS-CdSe. After its top is coated with a II-VI group compound such as CdS-CdSe by evaporation or the like, the photoelectric conversion element 5 of island form is formed in the main scanning direction in parallel with the illumination window 3, and activation heat treatment is carried out. |
