RESIST MATERIAL AND ITS PREPARATION

摘要

PURPOSE:To obtain a resist material made of a siloxane polymer high in sensitivity and resolution by introducing chloromethyl groups into a silicone polymer having phenyl groups. CONSTITUTION:The resist material is made of a siloxane polymer represented by formula I having R1, R2, R3 being selected from alkyl, optionally substd. phenyl in the side chain and it is synthesized by subjecting a dichlorosilane compd. represented by formula II and diphenylsilanediol to dehydrochlorination condensation reaction. Thi resist material has high glass transition point, and the presence of the chloromethyl groups linked to the phenyl groups imparts high reactivity to high energy radiation and high resolution. The high content of Si enhances oxygen plasma resistance.