发明名称 |
PROCESS FOR ALUNINIUM SURFACE PREPARATION |
摘要 |
A method for treating an aluminum sheet useful for lithography by etching said sheet in an aqueous bath containing up to about 25% of nitric and/or hydrochloric acids and from about 1% to about 25% of an inorganic fluorine containing acid or salt thereof. Said etching step is sequentially followed by electrochemical graining and anodizing process steps. |
申请公布号 |
AU4280685(A) |
申请公布日期 |
1985.12.19 |
申请号 |
AU19850042806 |
申请日期 |
1985.05.23 |
申请人 |
AMERICAN HOECHST CORP. |
发明人 |
JOHN E. WALLS |
分类号 |
B41N3/00;B41N3/03;C23F1/20;C25D11/04;C25D11/08;C25D11/16;C25F3/04 |
主分类号 |
B41N3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|