发明名称 PROCESS FOR ALUNINIUM SURFACE PREPARATION
摘要 A method for treating an aluminum sheet useful for lithography by etching said sheet in an aqueous bath containing up to about 25% of nitric and/or hydrochloric acids and from about 1% to about 25% of an inorganic fluorine containing acid or salt thereof. Said etching step is sequentially followed by electrochemical graining and anodizing process steps.
申请公布号 AU4280685(A) 申请公布日期 1985.12.19
申请号 AU19850042806 申请日期 1985.05.23
申请人 AMERICAN HOECHST CORP. 发明人 JOHN E. WALLS
分类号 B41N3/00;B41N3/03;C23F1/20;C25D11/04;C25D11/08;C25D11/16;C25F3/04 主分类号 B41N3/00
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