| 摘要 |
PURPOSE:To contrive accomplishment of a highly precise control over the semiconductor manufacturing process as well as to expedite said control by a method wherein a measuring process is provided between each treatment process, and the condition of each treatment process is established based on the measured data of the adjoining measuring process. CONSTITUTION:A measuring process is provided between each process constituting the manufacturing process of a semiconductor device. Each process 1 is controlled by a controlling part 3 based on the data obtained by the measuring process 2 located adjoining to the process 1. To be more precise, a controlling signal Si+1 is formed by the controlling part 3 based on the measured data Ti sent from the measuring process 2 and the desined data M given from outside, and the controlling signal is inputted to the treatment process 1. A treatment is performed based on said controlling signal by the treatment process 1. As a result, the control of a treatment process is automated, the control is performed in a highly precise manner, the speed of control is improved, and also the stability of control can be improved.
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