| 摘要 |
PURPOSE:To enable the vapor deposition velocity to control understructively in case of forming a vapor deposited film on the surface of a base plate by means of a vacuum depositing method by making a control signal of the current or voltage preset as the function of time and thereby controlling the vapor deposition velocity. CONSTITUTION:When the vapor depositing substance from an evaporation source 12 is vapor deposited on a base plate, a vapor deposited film is formed on the surface of a crystal resonator 11 of the inside of a monitor head 15 and the intrinsic number of vibration of the resonator 11 is changed in accompanying thereto and the thickness of the vapor deposited film is calculated thereby and the vapor deposition velocity V is calculated in relation with time. The current or voltage which is fed to an electric source 14 for heating the evaporation source is controlled by performing feedback so that the difference ¦Vc-V¦ between the velocity V and the vapor deposition velocity Vc which is preset to the vapor deposition velocity controller 13 of the crystal resonator becomes zero. By this method, the control of forming velocity of the vapor deposited film on the base plate can be undestructively performed continuously.
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