| 摘要 |
PURPOSE:To enable to control the two dimensional arrangement of a monomolecular film or a monomolecular accumulated film by a method wherein, after an ion beam has been scanned on the surface of a base in a reducing gas atomsphere, the monomolecular film or the monomolecular accumulated film is formed, and then a pattern is formed thereon. CONSTITUTION:For example, a glass substrate 1-1 whereon an ITO1-2 is deposited is used as a substrate. Hydrogen is flowed into the surface part of a base, an Si ion beam is scanned in the form of pattern, and a modified layer 1-3 is formed on the base. Then, a monomolecular accumulated film of arachidic acid is formed by performing an LB method using a chloroform solution of arachidic acid. A monomolecular accumulated film 1-5 of arachidic acid is not formed on a non-modified part 1-5, and it is formed on the modified part 1-4 only according to the pattern. |
