发明名称 PROCESSING METHOD OF PATTERN
摘要 PURPOSE:To store information and to prevent the sensor processing allocation to each pattern component from an error due to the positional shift of patterns between sensors or the difference of shapes by allocating processing sensors to respective pattern components on the basis of the relative positions of plural sensors and their corresponding results. CONSTITUTION:Adjacent vidual field areas on an object 1 to be read out are read out so as to be overlapped by sensors N, N+1 and stored in pattern memories 11, 12 respectively. Receiving pattern processing information including an input overlapped part from a control circuit 41, an outline tracking processing circuit 21 segments the pattern of the corresponding processing area from the pattern memories 11, 12 in each sensor while referring the relative position information between sensors from inter-sensor relative position information memory 31. Then, the circuit 21 separates the patterns in the segmented processing area into a series of pattern components by outline tracking processing and stores the outline information and the coordinates of the outmost point of every direction.
申请公布号 JPS60179885(A) 申请公布日期 1985.09.13
申请号 JP19840034238 申请日期 1984.02.27
申请人 HITACHI SEISAKUSHO KK 发明人 YOSHIDA MINORU
分类号 G06K9/20;G06K9/34;G06K9/36 主分类号 G06K9/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利