发明名称 SAMPLE HOLDING JIG APPARATUS FOR VACUUM APPARATUS
摘要 PURPOSE:To obtain sufficient close contactness of wafer and substrate electrode without using metal material by forming a flat plate, a bar, a hollow jig and a spring with nonmetallic material or convering them with nonmetallic material so that the metal is not exposed. CONSTITUTION:A flat plate 5 for holding wafer 8 opposing to a target electrode 1, a bar 4 for supporting this flat plate 5, a hollow jig 3 to which such bar 4 is inserted through a spring 2, and a wafer positioning flat plate 12 which applies a force against the spring 2 in the direction of target electrode 1 through close contact with the rear surface of wafer 8 held by said flat plate 5 are provided. Said falt plates 5, 12, bar 4, hollow jig 3 and spring 2 are formed with nonmetallic material or are convered with nonmetallic material so that the metal part is not exposed. For example, the flat plate 5, bar 4, hollow jig 3 are made of quartz, the substrate electrode 9 is shifted toward the wafer 8 and is placed close contact with the rear surface of wafer 8 through a heat transmitting sheet 12. After it is placed close contact with the rear surface of wafer it is shifted until the distance between the wafer 8 and target electrode 1 becomes the predetermined value.
申请公布号 JPS60180125(A) 申请公布日期 1985.09.13
申请号 JP19840036487 申请日期 1984.02.27
申请人 NIPPON DENSHIN DENWA KOSHA 发明人 TAKEUCHI HIDEAKI;OIKAWA HIDEO
分类号 H01J37/30;H01L21/302;H01L21/67;H01L21/68 主分类号 H01J37/30
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