| 摘要 |
PURPOSE:To manufacture a lattice having a deep groove by applying the first photoresist film, a metallic film, and the second photoresist film onto the surface of a substrate, and repeating an exposure and an etching. CONSTITUTION:The first photoresist film 2 is applied to a substrate 1, and thereafter, a metallic film 3 is coated, and also the second photoresist film 4 is applied on said film. Subsequently, a laser light interference fringe is exposed to the second resist film 4, and developed by a developer. Next, the metallic film 3 is etched by a chemical etching liquid, and a lattice having a roughly rectangular section is formed on the metallic layer 3. Subsequently, a deep groove is formed on the first resist layer by irradiating a far-ultraviolet ray from the upper face of the lattice. The metallic layer mask 3 is melted and removed by a chemical etching liquid, and therefore, etching is executed to the substrate surface by an argon ion beam from the vertical direction, by which a corner of the lattice becomes round. |
