| 摘要 |
PURPOSE:To attain a high-precision device by providing a correction signal generator which corrects the dimensional ununiformity due to an optical system in case of projection and transfer of a reticle and applying a dimension correction signal to a beam control signal generator to control irradiation of an exciting beam. CONSTITUTION:A dimension correction signal generator 3 receives information from a stage position measuring system 4 and information from a computer 1 and outputs a correction signal 3a to a beam control signal generator 2. The beam control signal generator 2 adds the correction signal 3a to a beam control signal before correction to output corrected control signals 6a and 7a. If four ICs where patterns 32 are described on chips 31 are included in one frame, data which reduces dimensions in wafer exposure in accordance with the length from a center Mis prepared, and correction is so performed that parterns are too large by this data. Thus, exposed patterns which are uniform throughout the surface are obtained because errors of peripheral parts at a reduction exposure time are corrected preliminarily in the generated reticle. |
