发明名称 |
CAPACITIVE MASK REGULATOR |
摘要 |
An aligner for aligning a mask and a wafer during photolithography of a semiconductor chip uses detection of the differential capacitance between two sets of conductive fingers on the mask and ridges on the wafer. An A.C. signal is coupled between the ridges and the fingers and the phase or amplitude of the signals is detected. An aligner utilizing multiple groups of ridges and fingers allows rotational alignment or two axis lateral alignment. An aligner having reference ledges to which the mask and the wafer are capacitively coupled allows alignment when the distance between the mask and the wafer is too great to permit meaningful capacitive coupling between the mask and the wafer to occur. |
申请公布号 |
JPS60137018(A) |
申请公布日期 |
1985.07.20 |
申请号 |
JP19840212781 |
申请日期 |
1984.10.12 |
申请人 |
VARIAN ASSOC |
发明人 |
AAMANDO PII NUUKAAMANZU;JIEEMUZU EICHI BOIDEN;GIYARETSUTO EE GIYARETSUTOSON |
分类号 |
H01L21/027;G01B7/31;G03F9/00;H01L21/30 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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